WF0009Q-1200AA

1200V, 9mΩ, SiC MOSFET Bare Die

Status: Under development (Samples available)

Trench SiC-MOSFET process technology and optimal structural design realize low-loss, high-reliability devices.

Features

  • Applying high-quality process technology cultivated in Si power devices to SiC-MOSFET
  • In addition to the Bottom P-Well structure that protects the gate oxide film, Mitsubishi original structure (SPW*1, J-FET doping*2) realizes high gate reliability, low Ron, and low switching loss.
  • Low on-resistance characteristics and high reliability achieved through optimal structural design and high-quality process technology
  • Surface electrodes are compatible with solder joints
  • *1:Side P-Well
    *2:Technology to increase the impurity concentration in the JFET (Junction Field Effect Transistor) region and increase the density of the device.

Applications

  • EV・HEV
  • On-board charger
  • Charging infrastructure

Main Specifications

Parameter Level Value Unit
Device SiC MOSFET Bare Die
VDSS Min 1200 V
RDS(ON) Typ 9 *
Supply situation Under development
Main Applications Automotive

Please contact us for samples, data sheets and application notes.

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SiC Power Devices

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