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FOR IMMEDIATE RELEASE No. 3750

Sub-nanosecond pulsed deep-ultraviolet laser system

Sub-nanosecond pulsed deep-ultraviolet laser system

TOKYO, November 26, 2024 - Mitsubishi Electric Corporation (TOKYO: 6503) announced today that it has developed, in collaboration with the Institute of Physical and Chemical Research (RIKEN) and the Institute for Molecular Science (IMS) of the National Institutes of Natural Sciences, a high-energy short-pulse* (sub-nanosecond) deep ultraviolet (DUV) wavelength laser system that achieves an output energy of 235 millijoules, the world's highest class** pulse energy. The compact and portable laser system has been installed in a dedicated area of RIKEN's facility at IMS in Japan, where it will be used for accelerator research and development.
Sub-nanosecond pulses were achieved by using a microchip laser capable of generating extremely short pulses, and high energy output was realized by optimizing the beam diameter. In addition, co-developed their Distributed Face Cooling technology is implemented in a high-heat dissipation chip developed by RIKEN and IMS, enabling the joule-class laser to operate at room temperature, unlike conventional high-power lasers that require low-temperature cooling.
Going forward, Mitsubishi Electric will continue to advance its laser acceleration technology and laser system miniaturization, thereby contributing to technological innovation in a wide range of fields.


  1. *Electromagnetic waves or light pulses that release energy in a very short period of time, typically with pulse durations of less than 1 nanosecond (one billionth of a second). By shortening the pulse duration, it is possible to increase the peak power even with the same amount of energy, making it useful for applications such as laser processing.
  2. **According to Mitsubishi Electric's research as of November 26, 2024.

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